FE-scanning electron microscopy with FIB
high-resolution Field Emission REM with
- FIB (Focused Ion Beam) – for cutting the samples via the ion beam
- EDX detector – for micro area analysis
- Different detectors (Inlens, Everhardt-Thornley, 4- quadrant BSE, ESB, STEM) for ideal imaging
- Charge Compensation – to reduce charging of non-conductive samples
Sputtering and vaporization facilities
to create a conductive surface coating. Reproducible layer depth. Option to coat with platinum-palladium, carbon, chrome, gold-palladium, and gold
Universal research microscope
with facilities for:
- Phase contrast
- Differential interference contrast
- Incident light fluorescence
Incident light microscope
for the study of materialographic bevels. Contrast methods, brightfield, darkfield, and differential interference contrast.
Material scientific stereomicroscope
for the characterization of three-dimensional structures. Significant magnification abilities. Chromatic level-adjusted objectives. Macroscope function (permits images with extended depth focus). Extensive lighting options. Motor control.
for the polarization of orthoscopic measurements (e.g., double refraction measurement on fibers) and conoscopy (position of the optical axis). A wide range of compensators.
High-resolution microscope camera
with a universal adapter for all microscopes. Peltier cooled sensor for low-noise images in poor lighting conditions.
Confocal Raman microscope
for material characterization. Differentiation between plastics, carbon fibers, liquids, and so forth. Structural analysis of fiber surfaces as well as cross-sections.